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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Thickness Dependence of Electrical Properties of Highly (100)-Oriented BaTiO_3 Thin Films Prepared by One-Step Chemical Solution Deposition
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Thickness Dependence of Electrical Properties of Highly (100)-Oriented BaTiO_3 Thin Films Prepared by One-Step Chemical Solution Deposition

机译:通过一步化学溶液沉积制备高度(100)取向的BaTiO_3薄膜的电学性质对厚度的依赖性

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摘要

Highly (100)-oriented BaTiO_3 thin films having different thicknesses of 70-280nm were deposited on Pt/TiO_x/SiO_2/Si substrates with LaNiO_3 as a buffer layer by one-step chemical solution deposition. X-ray diffraction analyses showed that the LaNiO_3 and BaTiO_3 layers were all under tensile stress. The tensile stress of the LaNiO_3 layer increased after depositing BaTiO_3 films. The tensile stress in both the LaNiO_3 and BaTiO_3 layers decreased with increasing BaTiO_3 layer thickness. The thickness dependences of the dielectric and piezoelectric behaviors of the highly (100)-oriented BaTiO_3 films were investigated. It was found that the effect of tensile stress on the dielectric and piezoelectric properties is dominant. A reduction in in-plane tensile stress (primarily arising from a thermal expansion mismatch) was considered effective for increasing the dielectric and piezoelectric constants. The measured dielectric constant increased from about 313 for 70 nm films up to 831 for 280 nm films. The local effective piezoelectric coefficient increased from 15 pm/V for 70 nm films up to 45 pm/V for 280 nm films.
机译:通过一步化学溶液沉积,在具有LaNiO_3作为缓冲层的Pt / TiO_x / SiO_2 / Si衬底上沉积具有70-280nm不同厚度的高度(100)取向的BaTiO_3薄膜。 X射线衍射分析表明,LaNiO_3和BaTiO_3层均处于拉应力状态。沉积BaTiO_3薄膜后,LaNiO_3层的拉伸应力增加。 LaNiO_3和BaTiO_3层中的拉伸应力均随BaTiO_3层厚度的增加而降低。研究了高度(100)取向的BaTiO_3薄膜的介电和压电行为的厚度依赖性。发现拉应力对介电和压电性能的影响是主要的。平面内拉应力的减小(主要是由于热膨胀失配引起的)被认为对于增加介电常数和压电常数是有效的。所测量的介电常数从70 nm膜的约313增加到280 nm膜的831。局部有效压电系数从70 nm膜的15 pm / V上升到280 nm膜的45 pm / V。

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