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Electrostatic-Actuated Suspended Ribbon Structure Fabricated in Single-Crystalline SiC by Selective Photoelectrochemical Etching

机译:选择性光电化学刻蚀在单晶SiC中制备的静电致动悬浮带状结构

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摘要

An electrostatic-actuated suspended ribbon structure composed of single-crystalline SiC is presented. All the main parts of the structure, namely, a suspended ribbon, posts, base plate, and electrical connections, are made of homoepitaxially grown single-crystalline 4H-SiC with selective ion implantations. Electrical isolation between the ribbon and the base plate is established with a pnp junction. The structure is fabricated by a combination of reactive ion etching (RIE) and doping-selective photoelectrochemical (PEC) etching. The suspended ribbon is actuated by applying a voltage between the ribbon and the base plate.
机译:提出了一种由单晶SiC构成的静电致动悬浮带状结构。结构的所有主要部分,即悬浮带,柱,基板和电连接,均由同质外延生长的单晶4H-SiC制成,并进行选择性离子注入。带和基板之间的电隔离通过pnp结建立。通过反应离子刻蚀(RIE)和掺杂选择性光电化学(PEC)刻蚀的组合来制造该结构。通过在色带和基板之间施加电压来驱动悬浮的色带。

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  • 来源
    《Japanese journal of applied physics》 |2009年第11期|111101.1-111101.4|共4页
  • 作者单位

    Department of Electronic Science and Engineering, Kyoto University, Nishikyo-ku, Kyoto 615-8510, Japan;

    Department of Electronic Science and Engineering, Kyoto University, Nishikyo-ku, Kyoto 615-8510, Japan;

    Department of Electronic Science and Engineering, Kyoto University, Nishikyo-ku, Kyoto 615-8510, Japan;

    Department of Electronic Science and Engineering, Kyoto University, Nishikyo-ku, Kyoto 615-8510, Japan Photonics and Electronics Science and Engineering Center (PESEC), Kyoto University, Nishikyo-ku, Kyoto 615-8510, Japan;

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