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Ambipolar Behavior in Epitaxial Graphene-Based Field-Effect Transistors on Si Substrate

机译:Si衬底上基于外延石墨烯的场效应晶体管的双极行为

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摘要

In this research, ambipolar behavior, which is one of graphene's unique characteristics, is studied for the epitaxial graphene formed on 3C-SiC grown on a Si substrate. The graphene channel is believed to be unintentionally p-type-doped at Dirac-point voltages of approximately +0.11 to +0.12 V. However, as drain voltage negatively increases, Dirac point voltage shifts. The drain current in the p-ohannel mode of operation saturates at a lower level than that in the n-channel mode of operation. These behaviors are caused by asymmetric carrier transport throughout channel-substrate heterojunctions (i.e., graphene, thin n-type SiC layer, and p-type Si substrate) and source/drain Schottky metal contacts. The interface between the p-type Si substrate and n-type SiC has a significant effect on transport in graphene channels. The results may be helpful for understanding transport in the device and for suppressing ambipolar operation, leading to a unipolar FET operation.
机译:在这项研究中,研究了在硅衬底上生长的3C-SiC上形成的外延石墨烯的双极性行为,这是石墨烯的独特特性之一。据信石墨烯沟道在约+0.11至+0.12 V的狄拉克点电压下无意间被p型掺杂。但是,随着漏极电压负向增加,狄拉克点电压发生偏移。与n通道工作模式相比,p沟道操作模式下的漏极电流饱和的水平较低。这些行为是由于整个沟道-衬底异质结(即石墨烯,薄的n型SiC层和p型Si衬底)和源/漏肖特基金属接触中的不对称载流子传输引起的。 p型Si衬底和n型SiC之间的界面对石墨烯通道中的传输有重要影响。结果可能有助于理解器件中的传输并抑制双极性操作,从而导致单极性FET操作。

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  • 来源
    《Applied physics express》 |2010年第6issue2期|P.06GG01.1-06GG01.5|共5页
  • 作者单位

    Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan;

    Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan;

    Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan;

    Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan;

    Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan;

    Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan JST-CREST, Chiyoda, Tokyo 1020075, Japan;

    Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan JST-CREST, Chiyoda, Tokyo 1020075, Japan;

    Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan JST-CREST, Chiyoda, Tokyo 1020075, Japan;

    Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan JST-CREST, Chiyoda, Tokyo 1020075, Japan;

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