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首页> 外文期刊>Japanese journal of applied physics >Ultrahigh-Voltage SiC PiN Diodes with an Improved Junction Termination Extension Structure and Enhanced Carrier Lifetime
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Ultrahigh-Voltage SiC PiN Diodes with an Improved Junction Termination Extension Structure and Enhanced Carrier Lifetime

机译:超高压SiC PiN二极管,具有改进的结终止扩展结构和更长的载流子寿命

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摘要

Ultrahigh-voltage SiC PiN diodes with an improved junction termination extension (JTE) structure and improved forward characteristics are presented in this paper. An improved space-modulated JTE (SM-JTE) structure was designed by device simulation, and a breakdown voltage of over 17 kV was obtained in a wider range of JTE dose with the improved SM-JTE. In addition, a lifetime enhancement process (thermal oxidation) was performed to improve the forward characteristics. The on-resistance of the SiC PiN diodes with the lifetime enhancement process was reduced to 13mΩcm~2 at 150℃ compared with that of the SiC PiN diodes with the conventional process (32mΩcm~2).
机译:本文介绍了具有改进的结终端扩展(JTE)结构和改进的正向特性的超高压SiC PiN二极管。通过器件仿真设计了一种改进的空间调制JTE(SM-JTE)结构,并通过改进的SM-JTE在更大的JTE剂量范围内获得了超过17 kV的击穿电压。另外,进行了寿命延长处理(热氧化)以改善正向特性。与传统工艺的SiC PiN二极管(32mΩcm〜2)相比,寿命延长工艺的SiC PiN二极管在150℃时的导通电阻降低到13mΩcm〜2。

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  • 来源
    《Japanese journal of applied physics》 |2013年第7issue1期|070204.1-070204.4|共4页
  • 作者单位

    Department of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510, Japan;

    Department of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510, Japan;

    Department of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510, Japan;

    Department of Electronic Science and Engineering, Kyoto University, Kyoto 615-8510, Japan;

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