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机译:通过凹栅和氟等离子体处理在Si(111)上常关的AlGaN / GaN高电子迁移率晶体管
Natl Cheng Kung Univ, Dept Elect Engn, Inst Microelect, Tainan 701, Taiwan|Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Tainan 701, Taiwan;
Natl Cheng Kung Univ, Dept Elect Engn, Inst Microelect, Tainan 701, Taiwan|Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Tainan 701, Taiwan;
Natl Cheng Kung Univ, Dept Elect Engn, Inst Microelect, Tainan 701, Taiwan|Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Tainan 701, Taiwan;
Natl Cheng Kung Univ, Dept Elect Engn, Inst Microelect, Tainan 701, Taiwan|Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Tainan 701, Taiwan|Kun Shan Univ Technol, Dept Elect Engn, Tainan 710, Taiwan;
机译:凹入式栅极结构对常关AlGaN / GaN高电子迁移率晶体管性能的比较
机译:采用氧等离子体处理的常关型p-GaN / AlGaN / GaN高电子迁移率晶体管
机译:常关的P-GaN / AlGaN / GaN高电子迁移晶体管使用氧等离子体处理
机译:在8英寸硅(111)基板上生长的凹陷 - 栅极AlGaN / GaN金属氧化物半导体高电子迁移率晶体管的稀释KOH钝化性能改进
机译:在AlGaN / GaN高电子迁移率晶体管上进行等离子增强化学气相沉积的氮化硅钝化的热稳定性。
机译:质子辐照对常断型AlGaN / GaN栅嵌入式金属-绝缘体-半导体异质结构场效应晶体管随时间变化的介电击穿特性的影响
机译:常关P-GaN门控AlGaN / GaN Hemts使用等离子体氧化技术在接入区域中