机译:Fe_3O_4磁性电极通过反应离子刻蚀微图案化的多铁性Fe_3O_4 /(Bi_(3.25_Nd_(0.65)Eu_(0.10))Ti_3O_(12)复合薄膜的制备,漏电流和铁电特性
Univ Hyogo, Grad Sch Engn, Dept Chem Engn & Mat Sci, Himeji, Hyogo 6712201, Japan;
Univ Hyogo, Grad Sch Engn, Dept Chem Engn & Mat Sci, Himeji, Hyogo 6712201, Japan;
Univ Hyogo, Grad Sch Engn, Dept Chem Engn & Mat Sci, Himeji, Hyogo 6712201, Japan;
Univ Hyogo, Grad Sch Engn, Dept Chem Engn & Mat Sci, Himeji, Hyogo 6712201, Japan;
Univ Hyogo, Grad Sch Engn, Dept Chem Engn & Mat Sci, Himeji, Hyogo 6712201, Japan;
Univ Hyogo, Grad Sch Engn, Dept Elect Engn & Comp Sci, Himeji, Hyogo 6712201, Japan;
Univ Hyogo, Grad Sch Engn, Dept Elect Engn & Comp Sci, Himeji, Hyogo 6712201, Japan;
Univ Hyogo, Grad Sch Engn, Dept Elect Engn & Comp Sci, Himeji, Hyogo 6712201, Japan;
Univ Hyogo, Grad Sch Engn, Dept Elect Engn & Comp Sci, Himeji, Hyogo 6712201, Japan;
机译:聚合前驱体法制备Bi_(3.25)La_(0.75)Ti_3O_(12)薄膜的铁电性能和漏电流特性
机译:LaNiO_3电极对Bi_(3.25)Eu_(0.75)Ti_3O_(12)薄膜的微结构和铁电性能的影响
机译:金属有机化学气相沉积法制备多铁性Fe3O4 /(Bi3.25Nd0.65Eu0.10)Ti3O12复合薄膜的磁性和结构特征
机译:P(VDF-TRFE)/ BI_(3.5)ND_(0.5)TI_3O_(12)双层复合铁电薄膜的制造和电性能
机译:用于嵌入式纳米磁器件制造的氮化硅薄膜的纳米级反应离子刻蚀
机译:Bi3.25LA0.75TI3O12薄膜的铁电性能和漏电流特性通过聚合物前体法制备