首页> 外文期刊>Japanese journal of applied physics >Magnetic and structural characteristics of multiferroic Fe3O4/(Bi3.25Nd0.65Eu0.10)Ti3O12 composite thin films deposited by metalorganic chemical vapor deposition
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Magnetic and structural characteristics of multiferroic Fe3O4/(Bi3.25Nd0.65Eu0.10)Ti3O12 composite thin films deposited by metalorganic chemical vapor deposition

机译:金属有机化学气相沉积法制备多铁性Fe3O4 /(Bi3.25Nd0.65Eu0.10)Ti3O12复合薄膜的磁性和结构特征

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摘要

Ferromagnetic magnetite (Fe3O4) thin films for magnetoelectric multiferroic applications were deposited on (200) (Bi3.25Nd0.65Eu0.10)Ti3O12 (BNEuT)/(101) Nb:TiO2 substrates by metalorganic chemical vapor deposition (MOCVD) using an iron(III) tris(2,2,6,6-tetramethyl-3,5-heptanedionato) precursor as the iron source. The BNEuT film utilized as a ferroelectric template material was in the form of freestanding nanoplates with narrow spaces between them. The effects of deposition conditions such as the deposition time and substrate temperature on the magnetic and structural characteristics of the Fe3O4/BNEuT composite films were investigated. All the films consisted of mostly single-phase Fe3O4 with a cubic inverse-spinel structure. When deposition was carried out at temperatures of 400-420 degrees C, the filling rates of particles introduced into the narrow spaces between the BNEuT nanoplates exhibited high values of 76-89% including the amorphous phase. This suggested that the deposition in this temperature range made progress according to the growth mechanism of MOCVD in the surface reaction rate determining state. Room-temperature magnetic moment-magnetic field curves for Fe3O4 thin films deposited at 400-500 degrees C for 60 min exhibited narrow rectangular hysteresis loops, indicating typical soft magnetic characteristics. (C) 2016 The Japan Society of Applied Physics
机译:通过使用铁( III)三(2,2,6,6-四甲基-3,5-庚二酮基)前驱体作为铁源。用作铁电模板材料的BNEuT膜是独立式纳米板的形式,它们之间有狭窄的空间。研究了沉积条件如沉积时间和衬底温度对Fe3O4 / BNEuT复合膜的磁性和结构特性的影响。所有的薄膜主要由具有立方反尖晶石结构的单相Fe3O4组成。当在400-420℃的温度下进行沉积时,引入到BNEuT纳米板之间的狭窄空间中的颗粒的填充率显示出76-89%的高值,包括非晶相。这表明在该温度范围内的沉积根据表面反应速率确定状态下MOCVD的生长机理而进展。 Fe3O4薄膜在400-500摄氏度下沉积60分钟的室温磁矩-磁场曲线显示出狭窄的矩形磁滞回线,表明典型的软磁特性。 (C)2016年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2016年第10s期|10TA01.1-10TA01.5|共5页
  • 作者单位

    Univ Hyogo, Grad Sch Engn, Dept Chem Engn & Mat Sci, Himeji, Hyogo 6712201, Japan;

    Univ Hyogo, Grad Sch Engn, Dept Chem Engn & Mat Sci, Himeji, Hyogo 6712201, Japan;

    Univ Hyogo, Grad Sch Engn, Dept Chem Engn & Mat Sci, Himeji, Hyogo 6712201, Japan;

    Univ Hyogo, Grad Sch Engn, Dept Chem Engn & Mat Sci, Himeji, Hyogo 6712201, Japan;

    Univ Hyogo, Grad Sch Engn, Dept Chem Engn & Mat Sci, Himeji, Hyogo 6712201, Japan;

    Univ Hyogo, Grad Sch Engn, Dept Elect Engn & Comp Sci, Himeji, Hyogo 6712201, Japan;

    Univ Hyogo, Grad Sch Engn, Dept Elect Engn & Comp Sci, Himeji, Hyogo 6712201, Japan;

    Univ Hyogo, Grad Sch Engn, Dept Chem Engn & Mat Sci, Himeji, Hyogo 6712201, Japan;

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