首页> 外文期刊>ISIJ international >Photolithographic Fabrication of a Micro-electrode Surface on a Carbon Steel Sheet for Local Hydrogen Permeation Measurements
【24h】

Photolithographic Fabrication of a Micro-electrode Surface on a Carbon Steel Sheet for Local Hydrogen Permeation Measurements

机译:用于碳钢片上的微电极表面的光刻制造,用于局部氢渗透测量

获取原文
获取原文并翻译 | 示例
           

摘要

Microelectrodes for hydrogen permeation measurements were fabricated by photolithography. Although the application of a positive-type photoresist coating was effective for the formation of a circle-shaped pattern with a diameter of several tens of micrometers on an iron surface, the coating had poor adhesion to the iron surface and poor durability in an H_2SO_4 solution. However, the addition of a silica coating derived from tetraethoxysilane (TEOS) on the iron surface as an inner layer resulted in improvement of durability as well as resistance of the coating. Furthermore, the introduction of a layer derived from a mixture of TEOS and glycidyl 3-trimethoxysilylpropyl ether (GPTMS) between the inner layer derived from TEOS and the photoresist coating resulted in long durability showing a large impedance of more than 10~9 Ω cm~2 for 4×10~5 s in an H_2SO_4 solution. Cathodic polarization of the microelectrode on the iron surface revealed that the hydrogen evolution reaction (HER) rate is dependent on the plane orientation of the surface. HER rate on an SCM435 steel surface also strongly depended on the microstructure and hardness of the local surface.
机译:通过光刻法制造用于氢渗透测量的微电极。尽管正型光致抗蚀剂涂层的应用对于在铁表面上形成具有几十微米的直径的圆形图案,但涂层对铁表面的粘附性差和H_2SO_4溶液中的耐久性差。然而,添加来自铁表面上的四乙氧基硅烷(TEOS)的二氧化硅涂层作为内层,导致耐久性的改善以及涂层的电阻。此外,在从TEOS和光致抗蚀剂涂层衍生自TEOS和光致抗蚀剂涂层的内层之间引入衍生自TEOS和缩水甘油基3-三甲氧基甲硅烷基丙基丙基醚(GPTMS)的混合物产生的长久阻抗大于10〜9Ωcm〜 2在H_2SO_4溶液中为4×10〜5秒。微电极对铁表面上的阴极偏振显示,氢进化反应(她的)速率取决于表面的平面取向。她对SCM435钢表面的速率也强烈依赖于局部表面的微观结构和硬度。

著录项

  • 来源
    《ISIJ international》 |2021年第4期|1112-1119|共8页
  • 作者单位

    Faculty of Engineering Hokkaido University Kita-13 Jo Nishi-8 Chome Kita-ku Sapporo 060-8628 Japan;

    Graduate School of Chemical Sciences and Engineering Hokkaido University Kita-13 Jo Nishi-8 Chome Kita-ku Sapporo 060-8628 Japan;

    Comprehensive Analysis Center for Science Saitama University Shimo-Okubo 255 Sakura-ku Saitama 338-8570 Japan;

    Faculty of Engineering Hokkaido University Kita-13 Jo Nishi-8 Chome Kita-ku Sapporo 060-8628 Japan;

    Faculty of Engineering Hokkaido University Kita-13 Jo Nishi-8 Chome Kita-ku Sapporo 060-8628 Japan;

    Research Institute for Electronic Science Hokkaido University Kita-21 Jo Nishi-10 Chome Kita-ku Sapporo 001-0021 Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    photolithography; microelectrode; hydrogen permeation; hydrogen evolution reaction; Devanathan-Stachurski cell;

    机译:光刻法;微电极;氢渗透;氢气进化反应;Devanathan-Stachurski细胞;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号