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Synthesis and Characterization of Nanocrystalline Zinc Oxide Thin Films for Optoelectronic Applications

机译:光电应用纳米氧化锌薄膜的合成与表征

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Metal oxide is highly important material which possesses many unique optical and electrical properties for applications in many areas such as Solar cells, Gas sensors and so on. With the development of research and applications of Metal oxide thin films, research results are verified that the morphology of Metal oxide thin films are plays an important role in applications of these films. Variety of morphologies, complex structure has been developed by physical or chemical methods. However the work on controlled growth of these films is still in developing state. Therefore in present work we deposited ZnO metal oxides thin films on different substrates by Chemical Bath Deposition Technique. Structural, Surface Morphology and Optical properties of as deposited films were investigated by XRD, SEM, and UV-VIS Spectrophotometer. The band gap is also calculated from the equation relating absorption co-efficient to wavelength. The band gap indicates the film is transmitting within the visible range and the band gaps changes because of the grain size of the films. We also observed that, the change in preparative parameters affects the deposition rate of thin films. From the observation, it is clear that the growth rate increases as the deposition temperature, deposition time, molarities of the solution increases. It is also clear that the growth rate increases as the film thickness and grain sizes increases while band gap decreases.
机译:金属氧化物是非常重要的材料,具有许多独特的光学和电气特性,可用于许多领域,例如太阳能电池,气体传感器等。随着金属氧化物薄膜的研究和应用的发展,研究结果证实金属氧化物薄膜的形态在这些膜的应用中起着重要的作用。通过物理或化学方法已经开发出各种形态,复杂结构。然而,关于这些膜的受控生长的工作仍处于发展状态。因此,在目前的工作中,我们通过化学浴沉积技术在不同的衬底上沉积了ZnO金属氧化物薄膜。通过XRD,SEM和UV-VIS分光光度计研究了沉积薄膜的结构,表面形态和光学性能。带隙也由将吸收系数与波长相关的方程式计算得出。带隙表示膜在可见光范围内透射,并且带隙由于膜的晶粒尺寸而改变。我们还观察到,制备参数的变化会影响薄膜的沉积速率。从观察可知,生长速率随着沉积温度,沉积时间,溶液摩尔浓度的增加而增加。同样清楚的是,生长速度随着膜厚度和晶粒尺寸的增加而增加,而带隙减小。

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