EVALUATION OF STABILITY OF TARGET HOMEMADE BY EFFECT OF TEMPERATURE, POWER AND FLOW IN THE DEPOSITION OF ZIRCONIA STABILIZED 8% Y_2O_3 THIN FILMS WITH RF SPUTTERING

摘要

The solid oxide fuel cells work normally at high temperatures (600 to 1000 ℃) and it is necessary to reduce it. It can be reducing the thickness of electrolyte using zirconia thin films at 8% stabilized with yttria. In this work, targets of zirconia 8% with yttria were elaborated and finally deposited on glass and silicon (100) as thin film by magnetron sputtering at different temperatures. The thin films have been deposited onto glass and silicon (100) substrates by sputtering RF process with temperature in situ. Parameters such as deposition power, temperature and flow have been optimized and evaluated. The structural, morphological and optical properties of the deposited films have been studied by X-ray diffraction (XRD), atomic force microscopy (AFM), transmission electron microscopy and optical absorption techniques, respectively. The cross section preparation was realized by focus ion beam (FIB). The X-ray diffraction analysis shows that the films are polycrystalline and the phase is cubic with preferential orientation (111). AFM studies reveal that the grains are uniform with uneven spherically shaped, distributed over the entire surface of the substrates. Optical absorption study shows the presence of direct transition with band gap energy from 4.205 to 4.230eV when temperature increases. The thickness of the thin films deposited onto silicon is constant with the increases of temperature; however, the glass thickness increases considerably at 500℃, 294nm. The preference deposition was onto the glass. Stability was tested for targets prepared by ceramic processing and deposited thin film with cubic phase and preference orientation.