Sputter target, used for thin film cathodic sputter deposition, is produced or regenerated by passing an IR source over target material to effect melting on a cast plate or worn target region

摘要

Sputter target production or recycling, using a overhead moving IR source (2) to melt target material on a cast plate (3) or worn target region, is new. A sputter target production or recycling process comprises covering a cast plate (3) or worn target region with target material pieces or melt and then supplying heat from an IR emitter (2) which is passed over the target material (1) to effect complete melting and then solidification of the target material.