Photoelectrolysis of water to hydrogen in p-SiC/Pt and p-SiC/ n-TiO_2 cell

摘要

The rates of photoelectrolysis of water to hydrogen and oxygen in p-SiC/Pt cells were found to depend on the surface treatment of p-XiC by aqua-regia-HF solution and also on electrocatalytic Pt metal islet deposition. The limiting currents were not dependent on the surface treatments by aqua-regia-HF solution or Pt metal islet deposition. The optimum etching time and Pt electrodeposition time were found to be 3 min and 5 s, respectively. The electrode potential under illumination of intensity was 50 mW cm~-2 and at open circuit condition was found to be 1.25 V Saturated calomel electrode (SCE) and was not dependent on the surface treatments.