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Current-voltage characteristics of Schottky diode simulated using semiconductor device equations

机译:利用半导体器件方程模拟肖特基二极管的电流-电压特性

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摘要

The Poisson's equation and the drift diffusion equations have been used to simulate the current-voltage characteristics of Schottky diode. The potential variation inside the bulk semiconductor near the metal-semiconductor contact was estimated first and then the current as a function of bias through the Schottky diode using silicon parameters were calculated over a wide temperature range. From the simulated current-voltage characteristics the diode parameters were extracted by fitting of current-voltage data into thermionic emission diffusion current equation. The derived barrier parameters are analysed to study the effect of various parameters, e.g. semiconductor thickness, doping concentration, temperature dependence of carrier mobility and energy band gap, on the current-voltage characteristics of Schottky diode in view of the thermionic emission diffusion current equations.
机译:泊松方程和漂移扩散方程已用于模拟肖特基二极管的电流-电压特性。首先估算在金属-半导体触点附近的体半导体内部的电势变化,然后在较大的温度范围内使用硅参数计算通过肖特基二极管的电流作为偏置的函数。通过将电流-电压数据拟合到热电子发射扩散电流方程中,从模拟的电流-电压特性中提取二极管参数。分析导出的势垒参数以研究各种参数的影响,例如考虑到热电子发射扩散电流方程,半导体厚度,掺杂浓度,载流子迁移率和能带隙的温度依赖性对肖特基二极管的电流-电压特性的影响。

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