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Effect of Proton and Electron Irradiation on Current-Voltage Characteristics of Rectifying Diodes Based on 4H-SiC Structures with Schottky Barrier

机译:质子与电子照射对基于4HOTKS屏障的4H-SIC结构的整流二极管电流 - 电压特性的影响

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Forward and reverse current-voltage (I-V) characteristics of commercial rectifying Schottky diodes (SDs) based on silicon carbide (4H-SiC, base layer doping level 3×10~(15) cm~(-3)) have been studied under irradiation with 0.9 MeV electrons and 15 MeV protons. The starting diodes were characterized by a barrier height of about 1.5 eV and nearly ideal forward and reverse I-V characteristics. It was found that, at doses exceeding the threshold dose D_th, the series differential resistance R_s of the diodes grows as R_s ~ D~m (m = 10-15) and shows no tendency toward saturation. D_(th)=7×10~(15) cm~(-2) under electron irradiation, and D_th=4×10~(13) cm~(-2) in the case of irradiation with protons. Heating to 200°C results in that R_s decreases with activation energy of about 1.1 eV and R_s is partly annealed-out with activation energy of ~0.7 eV. The barrier height of the starting SDs changes only slightly under irradiation, but, possibly, the irradiation leads to an over-compensation of the n-type layer and formation of an additional barriers in the form of a pn junction.
机译:基于碳化硅(4H-SiC,基层掺杂水平3×10〜(15)cm〜(-3))研究了商业整流肖特基二极管(SDS)的前进和反向电流 - 电压(IV)特性已经在照射下进行了研究含0.9mev电子和15mev质子。起始二极管的特征在于屏障高度约为1.5eV,几乎理想的前向和反向I-V特性。结果发现,在超过阈值剂量D_th的剂量下,二极管的串联差分电阻R_S为R_S〜D〜M(M = 10-15),并且没有显示饱和趋势。 D_(TH)= 7×10〜(15)cm〜(-2)在电子照射下,D_th = 4×10〜(13)cm〜(2)在辐照质子的情况下。加热至200°C导致R_S随着约1.1eV的激活能而降低,并且R_S与〜0.7eV的激活能量部分退火出来。起始SDS的屏障高度仅在照射下略微发生变化,但是,可能的辐射导致N型层的过度补偿和以PN结的形式形成额外的屏障。

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