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High-Resolution Fourier-Transform IR Spectroscopic Determination of Impurities in Silicon Tetrafluoride and Silane Prepared from It

机译:高分辨率傅里叶变换红外光谱法测定由此制备的四氟化硅和硅烷中的杂质

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摘要

The impurity compositions of silicon tetrafluoride and silane prepared from it have been determined by high-resolution Fourier-transform IR spectroscopy. In the spectra of SiF_4 samples differing in purity, we have identified rovibrational bands arising from Si_2F_6O, SiF_3OH, HF, SiF_3H, SiF_2H_2, SiH_3F, CH_4, CO_2, and CO impurities. Their detection limits lie in the range 9 x 10~(-5)(CO_2) to 3 x 10~(-3) mol % (Si_2F_6O). In the spectra of SiH_4 samples of different purity, we have detected CH_4, CO_2, SiF_3H, SiF_2H_2, and SiF_4 impurities. Their detection limits lie in the range 8 x 10~(-5) (CO_2) to 1 x 10~(-3) mol % (SiF_4).
机译:由其制备的四氟化硅和硅烷的杂质组成已经通过高分辨率傅里叶变换红外光谱法确定。在纯度不同的SiF_4样品的光谱中,我们已经确定了由Si_2F_6O,SiF_3OH,HF,SiF_3H,SiF_2H_2,SiH_3F,CH_4,CO_2和CO杂质引起的振动带。它们的检出限在9 x 10〜(-5)(CO_2)至3 x 10〜(-3)mol%(Si_2F_6O)的范围内。在不同纯度的SiH_4样品的光谱中,我们检测到CH_4,CO_2,SiF_3H,SiF_2H_2和SiF_4杂质。它们的检出限在8 x 10〜(-5)(CO_2)到1 x 10〜(-3)mol%(SiF_4)的范围内。

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