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Latent effects due to ESD in CMOS integrated circuits: review and experiments

机译:CMOS集成电路中ESD引起的潜在影响:综述和实验

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摘要

A review of the current information published on the subject of EOS/ESD latent failures is presented. In order to gain a better understanding of the phenomena involved in the input protection networks of CMOS integrated circuits, measurements were performed on both commercially available integrated circuits and a set of custom designed and fabricated devices. The tests investigated the effects of electrical stress, thermal shock, exposure to ultraviolet light, and thermal annealing. The results demonstrate the presence of latent failures in CMOS integrated circuits following exposure to ESD. The cumulative effect of repeated discharge can be partially alleviated using thermal annealing or exposure to light. A charge injection model is proposed to interpret the results.
机译:本文介绍了有关EOS / ESD潜在故障的最新信息。为了更好地理解CMOS集成电路的输入保护网络中涉及的现象,对市售集成电路和一组定制设计和制造的器件都进行了测量。这些测试调查了电应力,热冲击,紫外线照射和热退火的影响。结果表明,暴露于ESD后,CMOS集成电路中存在潜在故障。使用热退火或曝光可以部分减轻重复放电的累积效应。提出了电荷注入模型来解释结果。

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