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首页> 外文期刊>IEICE Transactions on Electronics >Increase in Contact Resistance of Hard Gold Plating during Thermal Aging - Nickel-Hardened Gold and Cobalt-Hardened Gold -
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Increase in Contact Resistance of Hard Gold Plating during Thermal Aging - Nickel-Hardened Gold and Cobalt-Hardened Gold -

机译:在热时效过程中增加硬金镀层的接触电阻-镍硬化金和钴硬化金-

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摘要

Contact resistance of nickel hardened gold electroplate (NiHG) deposited on nickel-underplated phosphor bronze disk coupons (substrate) after thermal aging was measured with a hard gold-plated beryllium copper alloy pin probe by means of a four--point probe technique, compared to that of cobalt-hardened gold electroplate (CoHG). Surface of NiHG plated coupons after aging was analyzed by X-ray photoelectron spectroscopy (XPS) to investigate the influence of the oxide film formation during thermal aging on contact resistance of NiHG electroplate, compared to that of CoHG. Initial contact resistance of the NiHG coupons was less than 10 mΩ at a contact forces more than 0.05 N, increased to 10 mΩ at a contact force of 0.05 N after 100 hours aging at 200℃. In contrast, contact resistance of the CoHG coupons progressively increased with increase in aging time, reached 1000 mΩ even at a contact force of 0.05 N after 52 hours aging. XPS analysis for the NiHG coupons demonstrated that nickel oxide film was formed on the NiHG surface in conformity with parabolic growth kinetics, as cobalt oxide film formed on CoHG surface. However, a thickness of the latter film was approximately 4- fold larger than that of former after 100 hours aging at 200℃. The small increase in contact resistance of NiHG coupons after aging suggested to be due to inhibitory of nickel oxide film growth on the surface. The cause of relatively low and steady contact resistance of NiHG during thermal aging was discussed.
机译:使用硬质镀金铍铜合金pin探针通过四点探针技术测量了热老化后沉积在未镀镍的磷青铜圆盘试片(基板)上的镍硬化金电镀层(NiHG)的接触电阻,与钴硬化金电镀(CoHG)相比。通过X射线光电子能谱(XPS)分析了老化后的NiHG电镀试样的表面,以研究热老化过程中氧化膜形成对NiHG电镀接触电阻(与CoHG相比)的影响。在200℃老化100小时后,当接触力大于0.05 N时,NiHG试样的初始接触电阻小于10mΩ,在接触力为0.05 N时,初始接触电阻增加至10mΩ。相反,CoHG试样的接触电阻随着老化时间的增加而逐渐增加,甚至在52小时老化后的0.05 N接触力下也达到1000mΩ。对NiHG试样的XPS分析表明,与抛物线生长动力学一致,在NiHG表面上形成了氧化镍膜,而在CoHG表面上形成了氧化钴膜。然而,在200℃下老化100小时后,后者的膜厚度比前者大约4倍。老化后,NiHG试样的接触电阻略有增加,这是由于抑制了表面氧化镍膜的生长。讨论了热老化过程中NiHG接触电阻相对较低和稳定的原因。

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