We reported that reactive sputtering by using two sputtering sources, one for the supply of Ti atoms and another for the supply of oxygen radicals was useful for the deposition of TiO_2 films at high rate above 20nm/min. In this work, structure and photocatalytic properties of the TiO_2 films deposited by the method were investigated. The film structure could be controlled by controlling the supply ratio R_o/R_(Ti) of oxygen molecules and titanium atoms to the substrate, and single phase anatase film was obtained at the supply ratio above 280. The films deposited in this study showed super hydrophilicity by the irradiation of ultraviolet rays, although the hydrophilicity were improved by the increase of the anatase phase in the film.%メタルモードで動作するTi原子供給用スパッタ源と、酸化物モードで動作する酸素ラジカル供給用のスパッタ源を組み合わせた反応性スパッタ法を用いて数十nm/min以上の高い堆積速度での成膜を実現している。この方法で作製されるTiO_2薄膜の結晶構造は、基板へのTi原子と酸素分子供給量の比R_o/R_(Ti)に依存し、R_o/R_(Ti)を小さい値から増加させていくと、ルチルとアナターゼの混相膜からR_o/R_(Ti)の値が280以上でアナターゼ単相へと変化することが分かった。得られた膜は、紫外線照射により全て超親水性を示すものの、アナターゼ相の多く含まれる膜の方が良好な特性を示した。
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