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Measurements of the bulk, C-axis electromechanical couplingconstant as a function of AlN film quality

机译:体积,C轴机电耦合的测量常数与AlN膜质量的关系

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Piezoelectric thin film AlN has great potential for on-chipndevices such as thin-film resonator (TFR)-based bandpass filters. ThenAlN electromechanical coupling constant, K2, is an importantnmaterial parameter that determines the maximum possible bandwidth fornbandpass filters. Using a previously published extraction technique, thenbulk c-axis electromechanical coupling constant was measured as anfunction of the AlN X-ray diffraction rocking curve [full width at halfnmaximum (FWHM)]. For FWHM values of less than approximately 4°, Kn2 saturates at approximately 6.5%, equivalent to the valuenfor epitaxial AlN. For FWHM values >4°, K2 graduallyndecreases to approximately 2.5% at a FWHM of 7.5°. These resultsnindicate that the maximum possible bandwidth for TFR-based bandpassnfilters using polycrystalline AlN is approximately 80 MHz and that, forn60-MHz bandwidth PCS applications, an AlN film quality of >5.5°nFWHM is required
机译:压电薄膜AlN对于基于薄膜谐振器(TFR)的带通滤波器等片上器件具有巨大潜力。然后,AlN机电耦合常数K2是决定带通滤波器最大可能带宽的重要材料参数。使用先前发表的提取技术,然后测量大体c轴机电耦合常数,作为AlN X射线衍射摇摆曲线的函数[最大半峰宽(FWHM)]。对于小于约4°的FWHM值,Kn2饱和约6.5%,相当于外延AlN的值n。对于FWHM值> 4°的情况,K2在7.5°的FWHM时逐渐降低到大约2.5%。这些结果表明,使用多晶AlN的基于TFR的带通滤波器的最大可能带宽约为80 MHz,并且对于60MHz带宽的PCS应用,要求AlN膜质量> 5.5°nFWHM

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