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首页> 外文期刊>IEEE Transactions on Semiconductor Manufacturing >New Device Structure Using Array Transistors and Flexible U-Grooves Suitable for 18-V, High-Performance SOI Complementary Bipolar LSIs
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New Device Structure Using Array Transistors and Flexible U-Grooves Suitable for 18-V, High-Performance SOI Complementary Bipolar LSIs

机译:使用阵列晶体管和柔性U形槽的新型器件结构,适用于18V,高性能SOI互补双极LSI

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摘要

We have developed a new device structure suitable for high-performance and high-power mixed signal large scale integrations (LSIs) using 0.35-μm SOI complementary bipolar transistors. The new structure is composed of array transistors for various operating currents and flexible U-groove (trench) layout for high-power transistors. Thermal simulation results showed that the thermal resistance could be reduced by 40% by using the flexible U-groove layout. Test structure measurements showed that the maximum operating currents of a double polysilicon self-aligned NPN transistor were improved by 2 and 3.5 times by using ballasting resistors and ballasting resistors with flexible U-groove layout, respectively. The effects of the transistor structure on the thermal resistance and the maximum operating current were discussed.
机译:我们已经开发出一种新的器件结构,该器件结构适合使用0.35μmSOI互补双极晶体管的高性能和高功率混合信号大规模集成(LSI)。新结构由用于各种工作电流的阵列晶体管和用于大功率晶体管的灵活的U形沟槽(沟槽)布局组成。热仿真结果表明,采用灵活的U型槽布局可以使热阻降低40%。测试结构测量表明,使用具有灵活U形槽布局的镇流电阻和镇流电阻分别将双多晶硅自对准NPN晶体管的最大工作电流提高了2倍和3.5倍。讨论了晶体管结构对热阻和最大工作电流的影响。

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