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机译:先进半导体制造中的湿法批量清洗工艺的特性
Dept. of Mech. Eng., Univ. of Texas at Austin, Austin, TX, USA;
batch processing (industrial); computational fluid dynamics; elemental semiconductors; etching; flow simulation; heat transfer; integrated circuit manufacture; monolithic integrated circuits; particle size; silicon; ultrasonic cleaning; CFD; FLUENT 6.2; advanced semiconductor manufacturing; baths; chemical etch; comprehensive sensitivity analysis; computational fluid dynamics simulations; critical particle size; fluid flow; heat transfer model; mass transfer; megasonic cleaning; polymeric contaminants; silicon wafers; tetra-ethyl orthosilicate blanket wafers; wet batch cleaning; experiments; wet cleaning;
机译:半导体制造过程中清洁阶段的湿台反应性危害
机译:通过三种清洁的高级氧化工艺降解偶氮染料:湿式氧化,电化学氧化和湿式电化学氧化-比较研究
机译:将非金属静电除尘器和湿式洗涤器集成在一起,以改善半导体制造业中的颗粒去除和腐蚀性气体清洁
机译:高级光刻,湿蚀刻和清洁半导体工艺(PPT)化学输送系统中微污染控制的未来
机译:半导体制造过程的鲁棒运行(批到批)优化和控制
机译:咖啡批次和连续湿法的比较:豆类副产品和废水中的主要化合物的变化
机译:湿手动清洁工艺与半导体工业中二氧化碳清洁工艺的比较