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Radiation tolerance of the FOXFET biasing scheme for AC-coupled Si microstrip detectors

机译:交流耦合Si微带检测器的FOXFET偏置方案的辐射容限

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The radiation response of FOXFETs (field oxide FETs) has been studied for proton, gamma, and neutron exposures. It is shown that the punch-through (PT) conduction mechanism is much less sensitive to radiation damage than the usual surface conduction in FOXFETs. The threshold voltage is strongly affected by the huge buildup of positive charge in the thick gate oxide. This effect can be reduced by decreasing the oxide thickness, but this modification seems to be unnecessary for detector applications. In fact, variations of a few volts of the PT voltage after irradiations in the Mrad range will result in a corresponding similar increase of the strip self-bias in detectors. Such modifications are still acceptable, and can be properly compensated by a suitable increase of the detector backside bias in order to ensure full depletion operation. It is also shown that the radiation-induced variations of the PT voltage can be tailored by the proper choice of the gate bias. Computer simulations have shown that the main radiation effects affecting the PT mechanism are the charge accumulation in the oxide and substrate-type inversion.
机译:已经对FOXFET(场氧化物FET)的辐射响应进行了质子,γ和中子暴露的研究。结果表明,与FOXFET的常规表面传导相比,穿通(PT)传导机制对辐射损伤的敏感性低得多。阈值电压受厚栅极氧化物中大量正电荷的强烈影响。可以通过减小氧化物的厚度来减小这种影响,但是这种修改对于检测器应用似乎是不必要的。实际上,在Mrad范围内的辐照之后,PT电压的几伏的变化将导致检测器中的条带自偏置的相应的类似增加。这样的修改仍然是可以接受的,并且可以通过适当增加检测器背面偏置来适当地补偿,以确保完全耗尽操作。还表明,可以通过适当选择栅极偏置来调整PT电压的辐射引起的变化。计算机仿真表明,影响PT机理的主要辐射效应是氧化物中的电荷积累和衬底型反型。

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