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Monte Carlo Simulations to Evaluate the Contribution of Si Bulk, Interconnects, and Packaging to Alpha-Soft Error Rates in Advanced Technologies

机译:蒙特卡洛模拟,用于评估先进技术中硅批量,互连和封装对Alpha-Soft错误率的贡献

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摘要

At ground level, alpha particles are a major source of soft errors. They may result from radioactive isotopes found in electronic device materials. In this paper, the materials' contributions to alpha particle-induced Soft Error Rate (SER) and MCU are evaluated for a 65 nm CMOS technology. The trend of SER on 45 and 32 nm is also reported in this paper. These evaluations are performed by Monte Carlo simulations, taking into account the radioactive impurity contamination levels in the device.
机译:在地面上,α粒子是软错误的主要来源。它们可能是由电子设备材料中发现的放射性同位素引起的。在本文中,针对65 nm CMOS技术评估了材料对α粒子诱导的软错误率(SER)和MCU的贡献。本文还报道了SER在45和32 nm上的趋势。考虑到设备中的放射性杂质污染水平,这些评估是通过蒙特卡洛模拟进行的。

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