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Alpha-Particle Induced Soft-Error Rate in CMOS 130 nm SRAM

机译:CMOS 130 nm SRAM中的Alpha粒子引起的软错误率

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摘要

We report the modeling and simulation of the soft-error rate (SER) in CMOS 130 nm SRAM induced by alpha-particle emission in silicon due to uranium contamination at ppb concentration levels. Monte-Carlo simulation results have been confronted to experimental data obtained from long-duration (${>}20 000$ h) real-time measurements performed at the under-ground laboratory of Modane (LSM) and from experimental counting characterization using an ultra low background alpha-particle gas proportional counter. The calibration of simulations with the measured SER allowed us to determine a $^{238}$U contamination level of 0.37 ppb (considered at secular equilibrium) in very good agreement with both corresponding alpha-particle emissivity levels measured and simulated at wafer-level in the range 1.1 to $2.3 times 10^{-3}$ alpha/cm$^{2}$ /h.
机译:我们报告建模和模拟的CMOS 130 nm SRAM中的软错误率(SER),该软错误率是由于ppb浓度的铀污染导致硅中的α粒子发射引起的。蒙特卡洛仿真结果已与长期获得的实验数据相对应( $ {>} 20 000 $ h)在Modane(LSM)地下实验室进行的实时测量,以及使用超低背景α粒子气体比例计数器进行的实验计数表征。使用测得的SER进行的模拟校准使我们能够确定0.37 ppb的 $ ^ {238} $ U污染水平(与在晶圆水平上测得并模拟的相应α粒子发射率水平在1.1到<2.3之间的很好的一致性,范围为2.3至10 ^ { -3} $ alpha / cm $ ^ {2} $ / h。

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