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Performance of NbN superconductive tunnel junctions as SIS mixers at 205 GHz

机译:NbN超导隧道结作为SIS混频器在205 GHz时的性能

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Small area (>or=1- mu m/sup 2/), high-current-density NbN-MgO-NbN tunnel junctions with I-V characteristics suitable for high-frequency mixers have been fabricated. Mesa-geometry junctions with an area of about 1 mu m/sup 2/ and critical current density of 5-10 kA/cm/sup 2/ are integrated with superconducting microstrip lines designed to resonate out the junction capacitance. Accurate values of junction capacitance and magnetic penetration depth are required for the proper design of the microstrip. A study was made of the mixer gain and noise performance near 205 GHz as a function of the inductance provided by the microstrip line. This has confirmed, at a high millimeter-wave frequency, values of junction capacitance of 85 fF/ mu m/sup 2/ and recently measured values of a magnetic penetration depth of 380 nm. Mixer noise temperatures as low as 134 K at 1.5 K have been obtained for properly tuned junctions. A significant improvement in mixer performance on cooling from 4.2 K to 1.5 K was observed. Edge-geometry junctions with an area of 0.3 mu m/sup 3/ and critical current density of 18-25 kA/cm/sup 2/ have also been fabricated. These junctions give a mixer noise temperature of 145 K at 4.2 K without the use of integrated tuning elements. These are the best results ever achieved for NbN-based SIS mixers.
机译:已经制造出具有适用于高频混频器的I-V特性的小面积(>或= 1μm/ sup 2 /),高电流密度NbN-MgO-NbN隧道结。台面几何结的面积约为1μm/ sup 2 /,临界电流密度为5-10 kA / cm / sup 2 /,与超导微带线集成在一起,这些超微带线设计用于使结电容产生谐振。正确设计微带线需要准确的结电容和磁通深度值。研究了205 GHz附近的混频器增益和噪声性能与微带线提供的电感的关系。这已经证实,在高毫米波频率下,结电容为85 fF /μm/ sup 2 /,并且最近测得的磁渗透深度为380 nm。对于正确调整的结点,已获得1.5 K的混频器噪声温度低至134K。从4.2 K冷却至1.5 K时,观察到混合器性能的显着提高。还制造了面积为0.3μm/ sup 3 /和临界电流密度为18-25 kA / cm / sup 2 /的边缘几何结。在不使用集成调谐元件的情况下,这些结在4.2 K时的混频器噪声温度为145K。这是基于NbN的SIS混频器有史以来最好的结果。

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