Effect of ion bombardment and bias fielding for [Ni/sub 81/Fe/sub 19//Cu] multilayers with giant magnetoresistance deposited by dual ion beam sputtering

摘要

Ni-Fe/Cu multilayers with giant magnetoresistance (GMR) mere deposited by dual ion beam sputtering method. Simultaneous ion bombardment during the film deposition changed the crystallite orientation in GMR multilayers. The specimen films with ion-bombarded GMR multilayer and unbombarded Fe buffer layer exhibited larger MR ratio and higher field sensitivity /spl Delta/MR//spl Delta/H. The films deposited under ion bombardment and bias fielding revealed dominant (100) orientation, and these (100)-oriented films seems to possess relatively better GMR characteristics.