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GMR Characteristics of Ni/sub 81/Fe/sub 19/ Cu Multilayers Deposited by Kr Sputtering with Ar Ion Bombardment on Interfaces

机译：Kr溅射结合Ar离子轰击沉积Ni / sub 81 / Fe / sub 19 / Cu多层膜的GMR特性

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《》|1997年|P.BQ-06-BQ-06|共1页
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Miyamoto; Y.; Watanabe; K.;
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中图分类无线电电子学、电信技术;
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1. MR characteristics of Ni/sub 81/Fe/sub 19//Cu multilayers deposited by Kr sputtering with Ar ion bombardment on interfaces [J] . Miyamoto Y., Watanabe K. IEEE Transactions on Magnetics . 1997,第5期

机译：Kr溅射结合Ar离子轰击沉积Ni / sub 81 / Fe / sub 19 // Cu多层膜的MR特性
2. Investigations of GMR characteristics and crystal structures for Ni/sub 81/Fe/sub 19//Cu multilayers with Ar ion bombardment on interfaces [J] . Miyamoto Y., Yoshitani T. IEEE Transactions on Magnetics . 1996,第5期

机译：Ni / sub 81 / Fe / sub 19 // Cu多层膜在界面处有Ar离子轰击的GMR特性和晶体结构的研究
3. Effect of ion bombardment and bias fielding for [Ni/sub 81/Fe/sub 19//Cu] multilayers with giant magnetoresistance deposited by dual ion beam sputtering [J] . Miyamoto Y., Yoshitani T. IEEE Transactions on Magnetics . 1995,第6期

机译：双离子束溅射沉积具有大磁阻的[Ni / sub 81 / Fe / sub 19 // Cu]多层膜的离子轰击和偏置场的影响
4. GMR Characteristics of Ni/sub 81/Fe/sub 19/ Cu Multilayers Deposited by Kr Sputtering with Ar Ion Bombardment on Interfaces [C] . Miyamoto Y., Watanabe K., Institute of Electric and Electronic Engineer IEEE International Magnetics Conference . 1997

机译：GMR特性Ni / Sub 81 / Fe / Sub 19 / Cu多层沉积在界面上的AR离子轰击沉积的Kr溅射
5. A comprehensive geological, petrological, and geochemical evaluation of the Voisey's Bay Ni-Cu-Co sulfide deposit: An integration of empirical data and process mechanics. [D] . Huminicki, Michelle A.E. 2007

机译：Voisey湾Ni-Cu-Co硫化物矿床的综合地质，岩石和地球化学评估：经验数据和过程力学的整合。
6. Study on Electrical Explosion Properties of Cu/Ni Multilayer Exploding Foil Prepared by Magnetron Sputtering and Electroplating [O] . Fan Lei, Qin Ye, Shuang Yang, 2020

机译：磁控溅射电镀铜/镍多层爆炸箔电爆炸性能的研究
7. Effects of Ion Bombardment on Interfaces of GMR Ni-Fe/Cu Multilayers [O] . Y. Miyamoto, K. Watanabe, S. Nakagawa, 1997

机译：离子轰击对GMR Ni-Fe / Cu多层界面的影响

GMR Characteristics of Ni/sub 81/Fe/sub 19/ Cu Multilayers Deposited by Kr Sputtering with Ar Ion Bombardment on Interfaces

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