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Annealing effect of surface magnetic properties in amorphous Co/sub 1-x/Ti/sub x/ thin films

机译:非晶Co / sub 1-x / Ti / sub x /薄膜中表面磁性能的退火效应

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摘要

For amorphous Co/sub 1-x/Ti/sub x/ (x=0.13, 0.16, 0.21 at.%) thin films, deposited by the DC magnetron sputtering method, ferromagnetic resonance experiments have been used to investigate the dependence of surface magnetic properties in relation to annealing temperatures (150/spl sim/225/spl deg/C). Spin wave resonance spectra for all annealing temperatures consist of several volume modes and one (or two) surface mode. It is suggested that both surfaces of the film have a perpendicular hard axis to the film plane (negative surface anisotropy). Also, the surface anisotropy K/sub s2/ at the substrate-film interface is varied slowly from -0.11 to -0.25 erg/cm/sup 2/ and the surface anisotropy K/sub s1/ at the film-air interface is varied from 0.16 to -0.53 erg/cm/sup 2/ with increasing annealing temperatures. We conjecture that the variation of surface anisotropy K/sub s1/ is due to the increase of Co concentration resulting from Ti oxidation for low temperature annealing (150-200/spl deg/C) and the diffusion of Co atoms near the film surfaces for high temperature annealing (225-250/spl deg/C).
机译:对于通过DC磁控溅射法沉积的非晶Co / sub 1-x / Ti / sub x /(x = 0.13,0.16,0.21 at。%)薄膜,铁磁共振实验已用于研究表面磁场的依赖性与退火温度(150 / spl sim / 225 / spl deg / C)有关的特性。所有退火温度的自旋波共振谱均由几种体积模式和一种(或两种)表面模式组成。建议膜的两个表面都具有垂直于膜平面的硬轴(负表面各向异性)。另外,基板-膜界面处的表面各向异性K / sub s2 /从-0.11到-0.25 erg / cm / sup 2 /缓慢变化,膜-空气界面处的表面各向异性K / sub s1 /从随退火温度的升高,从0.16到-0.53 erg / cm / sup 2 /。我们推测表面各向异性K / sub s1 /的变化是由于低温退火(150-200 / spl deg / C)时Ti氧化引起的Co浓度增加以及膜表面附近Co原子的扩散所致。高温退火(225-250 / spl deg / C)。

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