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Stencil printing process development for flip chip interconnect

机译:倒装芯片互连的模板印刷工艺开发

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Traditional methods for forming flip chip interconnection include evaporation and electroplating. While both options have proven performance records, their costs are too high for many of today's cost-sensitive applications. Motorola's Interconnect Systems Laboratory (ISL) developed a low cost flip chip interconnect alternative, which electroless plates Ni/Au as the under bump metallurgy (UBM), deposits solder paste using a stencil or photoresist mask, and reflows the paste to form solder bumps. This paper is focused on the stencil print process development for wafer solder bumping. Solder paste selection, characterization, stencil design, and process parameter optimizations are critical factors for successful fine pitch stencil printing. Fine mesh eutectic solder pastes (Type 5: -500+635, Type 6: -635) with different flux vehicles were evaluated for printability and reflow studies. Paste and flux modification and co-development with vendors for this specific application were conducted. An optimal paste, with specified viscosity and desired print, reflow, and cleaning behavior, was developed. Wafer stencil design rules were established to deposit the right amount of solder paste to form the required reflowed solder bump height without bridges between pads. Printing and reflow design of experiments were performed to establish the baseline and optimum process parameters. Solder bump characterizations, including bump height and uniformity, composition, shear force, and scanning electron microscope (SEM) bump profile and cross section microstructure analysis, were conducted. Development and characterization results are reported. This stencil print solder bump process is demonstrated on 4, 5, 6, and 8-in device wafers with pitches down to 200 /spl mu/m. Solder bumps are formed on wafers without bridges or missing bumps. Wafer level yield is <95% on die basis. Bump height standard deviation within die is less than 3%, and range is less than 15% of the average bump height. The 63 Sn/37 Pb eutectic-bumped functional device dice were flip chip assembled to test boards with Cu/Ni/Au pad metallization, and underfilled for interconnect reliability studies. All reliability requirements were met.
机译:形成倒装芯片互连的传统方法包括蒸发和电镀。尽管这两种选择都有可靠的性能记录,但对于当今许多对成本敏感的应用而言,它们的成本过高。摩托罗拉互连系统实验室(ISL)开发了一种低成本倒装芯片互连替代方案,该方案可使用化学镀Ni / Au作为凸点下冶金(UBM),使用模板或光致抗蚀剂掩模沉积焊膏,然后对焊膏进行回流形成焊点。本文的重点是用于晶圆焊料凸点的模版印刷工艺开发。焊膏的选择,特征,模板设计和工艺参数优化是成功进行小间距模板印刷的关键因素。对具有不同助焊剂载体的细孔共晶锡膏(类型5:-500 + 635,类型6:-635)进行了可印刷性和回流焊研究。进行了糊剂和助焊剂的修改,并与供应商共同开发了此特定应用程序。开发了具有指定粘度和所需印刷,回流和清洁性能的最佳浆料。建立了晶圆模板设计规则,以沉积适量的焊膏,以形成所需的回流焊凸点高度,而在焊盘之间没有桥接。进行实验的印刷和回流设计以建立基线和最佳工艺参数。进行了焊料凸点表征,包括凸点高度和均匀性,成分,剪切力以及扫描电子显微镜(SEM)凸点轮廓和横截面显微结构分析。报告了开发和表征结果。在4、5、6和8英寸器件晶圆上演示了这种模版印刷焊料凸点工艺,其间距低至200 / spl mu / m。焊料凸点形成在晶圆上,没有桥接或缺失的凸点。以晶片为基准,晶片水平的成品率<95%。芯片内的凸点高度标准偏差小于3%,范围小于平均凸点高度的15%。将63 Sn / 37 Pb共晶凸块功能器件管芯倒装芯片组装到具有Cu / Ni / Au焊盘金属化的测试板上,并进行底部填充以进行互连可靠性研究。满足所有可靠性要求。

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