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Taguchi design of experiment for wafer bumping by stencil printing

机译:田口设计的模板印刷晶圆凸点实验

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摘要

Taguchi experiments are designed and carried out with five critical factors that influence the solder bumping of a 200 mm (8 in) wafer by the stencil printing method. These factors are: paste types, squeeze forces, snap-off heights, aperture shapes, and aspect ratios. They are varied to form a two-level L8 orthogonal array experiment. Analysis of mean (ANOM) and analysis of variance (ANOVA) are used to choose the most influential factors. After fixing the most influential factors, a two-level L4 orthogonal array experiment is followed to optimize the remaining material and process parameters. Important results are summarized in this paper which could be very useful for wafer bumping with the stencil printing method.
机译:设计和执行Taguchi实验的五个关键因素会通过模版印刷方法影响200毫米(8英寸)晶片的焊料凸点。这些因素是:糊剂类型,挤压力,折断高度,开口形状和长宽比。它们被改变以形成二级L8正交阵列实验。均值分析(ANOM)和方差分析(ANOVA)用于选择最有影响力的因素。在确定最有影响力的因素之后,进行二级L4正交阵列实验以优化剩余的材料和工艺参数。本文总结了重要的结果,这些结果对于使用模版印刷方法进行晶圆凸块非常有用。

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