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Crystallographic Texture and Whiskers in Electrodeposited Tin Films

机译:电镀锡膜中的晶体织构和晶须

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摘要

Electron back scatter diffraction (EBSD) analysis was used to determine texture for electrodeposited tin films, and the results were compared to standard X-ray "times random" and full pole figure texture analysis. The data showed that EBSD and X-ray texture results differed as to primary and secondary texture determinations with some degree of correlation between texture determinations when primary/secondary/tertiary calculations were disregarded. It is these authors' opinion that film texture cannot be accurately determined using "times random" X-ray diffraction (XRD) techniques, and that there is considerable room for error with X-ray pole figure analyses. These data must be considered preliminary due to the small sample size, but these results indicate that electroplaters may have better control over as-deposited tin film texture than is currently believed, and that there is a relationship between as-deposited texture and film stress
机译:使用电子背散射衍射(EBSD)分析来确定电沉积锡膜的织构,并将结果与​​标准X射线“随机”和全极图织构分析进行比较。数据表明,当忽略一次/二次/三次计算时,EBSD和X射线纹理结果在主要和次要纹理确定方面有所不同,并且在纹理确定之间存在一定程度的相关性。这些作者的观点是,使用“时间随机” X射线衍射(XRD)技术无法准确确定胶片的质地,并且X射线极图分析存在很大的误差空间。由于样本量小,这些数据必须被认为是初步的,但是这些结果表明,电镀剂可能比目前认为的更好地控制了沉积的锡膜织构,并且沉积的织构与膜应力之间存在一定的关系。

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