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A synchrotron micro-diffraction investigation of crystallographic texture of high-Sn alloy films and its effects on whisker growth

机译:高锡合金薄膜晶体织构的同步加速微衍射研究及其对晶须生长的影响

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For electroplated Sn and Sn alloy finishes, one of the reliability concerns remains the risk of whisker growth. Results from recent work have suggested that whiskers are most likely to form in regions of the films where high stress or a stress gradient exists. If strain/stress distribution information can be collected at a grain-by-grain level, correlations between such information and the propensity of whisker growth can be further understood. In this work, we utilized a highly focused X-ray beam from a synchrotron source to perform micro-diffraction on a series of Sn and Sn-containing finishes. The high brightness and small beam size of the X-ray enabled the generation of grain-by-grain orientation map as well as the strain/stress levels in individual grains. The electroplated finishes analyzed included pure Sn, Sn-Cu, and Sn-Cu-Pb finishes with various concentrations of Cu and Pb. Plating current density was also varied for each finish composition and the textures of these finishes were compared. After plating, these finishes were stored at ambient condition and examined regularly for surface defect formation. Once hillock or whisker growth was observed, the areas surrounding the growth were scanned with the X-ray. Additionally, these samples were also analyzed with standard X-ray diffraction and inverse pole figures were generated to compare the texture of the samples. A finite element model was also generated to simulate the texture of the finishes. By implementing the stiffness matrix of the finishes, we were able to explicitly implement the variation of finish texture on a grain-by-grain basis, and thus assess the strain/stress distribution in the finish. The analytical and simulation results from this study suggest that plating process parameters such as current density have a significant impact on the crystallographic texture of the plated finishes. Under similar strain conditions, certain textures would generate higher stresses in the finishes and result i--n higher levels of whisker growth.
机译:对于电镀锡和锡合金表面处理,可靠性问题之一仍然是晶须生长的风险。最新工作的结果表明,晶须最可能在存在高应力或应力梯度的薄膜区域形成。如果可以逐粒地收集应变/应力分布信息,则可以进一步理解此类信息与晶须生长倾向之间的相关性。在这项工作中,我们利用了来自同步加速器源的高度聚焦的X射线束,对一系列含锡和含锡的涂层进行微衍射。 X射线的高亮度和小光束尺寸使得能够生成逐粒取向图以及单个晶粒中的应变/应力水平。分析的电镀表面处理包括纯锡,锡铜和锡铜铅表面处理,以及各种浓度的铜和铅。每种饰面组合物的​​电镀电流密度也有所不同,并比较了这些饰面的质地。电镀后,将这些整理剂储存在环境条件下,并定期检查表面缺陷的形成。一旦观察到小丘或晶须生长,就用X射线扫描生长周围的区域。此外,还使用标准X射线衍射分析了这些样品,并生成了反极性图形以比较样品的质地。还生成了一个有限元模型来模拟饰面的质感。通过实现饰面的刚度矩阵,我们可以逐粒地明确实现饰面纹理的变化,从而评估饰面中的应变/应力分布。这项研究的分析和模拟结果表明,电镀工艺参数(例如电流密度)对电镀表面处理的晶体结构有重大影响。在相似的应变条件下,某些纹理会在饰面中产生更高的应力,从而导致晶须生长水平更高。

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