机译:电子,质子和伽玛射线辐照对200 GHz SiGe HBT I-V特性的影响比较
Department of Studies in Physics, University of Mysore, Mysore, India;
Department of Studies in Physics, University of Mysore, Mysore, India;
Department of PG Studies in Physics, JSS College, Mysore, India;
Laboratory for Electro-Optics Systems, Indian Space Research Organization, Bengaluru, India;
Technical Physics Division, Baba Atomic Research Centre, Mumbai, India;
School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA, USA;
Department of Studies in Physics, University of Mysore, Mysore, India;
Silicon germanium; Protons; Annealing; Radiation effects; Heterojunction bipolar transistors; Degradation; Electric variables;
机译:200 GHz SiGe HBT中γ和质子辐射效应的比较
机译:X射线和质子辐射对200 GHz / 90 GHz互补$(npn + pnp)$ SiGe:C HBT技术的影响
机译:高能快速重离子辐照和退火对200?GHz SiGe HBT直流电特性的影响
机译:对200GHz SiGe HBT(HF 12)的100meV氧离子和C0-60γ辐照效应的比较
机译:在质子能量中心= 200 GeV的质子-质子和金-金碰撞中产生的非光子电子。
机译:电子和质子辐照检测器的瞬态电气和光学特性
机译:质子和X射线照射对厚膜SOI互补(NPN + PNP)SiGE HBT的DC和AC性能的影响