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首页> 外文期刊>Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on >Test-Pattern Selection for Screening Small-Delay Defects in Very-Deep Submicrometer Integrated Circuits
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Test-Pattern Selection for Screening Small-Delay Defects in Very-Deep Submicrometer Integrated Circuits

机译:用于筛选超深亚微米集成电路中小延迟缺陷的测试模式选择

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Timing-related defects are major contributors to test escapes and in-field reliability problems for very-deep submicrometer integrated circuits. Small delay variations induced by crosstalk, process variations, power-supply noise, as well as resistive opens and shorts can potentially cause timing failures in a design, thereby leading to quality and reliability concerns. We present a test-grading technique that uses the method of output deviations for screening small-delay defects (SDDs). A new gate-delay defect probability measure is defined to model delay variations for nanometer technologies. The proposed technique intelligently selects the best set of patterns for SDD detection from an $n$-detect pattern set generated using timing-unaware automatic test-pattern generation (ATPG). It offers significantly lower computational complexity and excites a larger number of long paths compared to a current generation commercial timing-aware ATPG tool. Our results also show that, for the same pattern count, the selected patterns provide more effective coverage ramp-up than timing-aware ATPG and a recent pattern-selection method for random SDDs potentially caused by resistive shorts, resistive opens, and process variations.
机译:与时序有关的缺陷是导致非常深的亚微米集成电路测试逃逸和现场可靠性问题的主要原因。由串扰,工艺变化,电源噪声以及电阻性开路和短路引起的小延迟变化可能会导致设计中的时序故障,从而导致质量和可靠性问题。我们提出一种测试分级技术,该技术使用输出偏差的方法来筛选小延迟缺陷(SDD)。定义了一种新的栅极延迟缺陷概率度量,以模拟纳米技术的延迟变化。所提出的技术从使用无时序自动测试模式生成(ATPG)生成的$ n $-检测模式集中,智能地选择用于SDD检测的最佳模式集。与当前的商用时序感知ATPG工具相比,它的计算复杂度大大降低,并且激发了许多长路径。我们的结果还表明,对于相同的图案数量,相比于时序感知型ATPG,所选择的图案提供了更有效的覆盖率提升,并且针对可能由电阻性短路,电阻性开路和工艺变化引起的随机SDD提供了最新的图案选择方法。

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