首页> 外文期刊>IEEE transactions on circuits and systems . I , Regular papers >Design of $2 times {rm V}_{rm DD}$-Tolerant I/O Buffer With PVT Compensation Realized by Only $1 times {rm V}_{rm DD}$ Thin-Oxide Devices
【24h】

Design of $2 times {rm V}_{rm DD}$-Tolerant I/O Buffer With PVT Compensation Realized by Only $1 times {rm V}_{rm DD}$ Thin-Oxide Devices

机译:只需$ 1倍{rm V} _ {rm DD} $薄氧化物器件即可实现具有PVT补偿的$ 2倍{rm V} _ {rm DD} $容限I / O缓冲器的设计

获取原文
获取原文并翻译 | 示例

摘要

A new $2times {rm V}_{rm DD}$-tolerant input/output (I/O) buffer with process, voltage, and temperature (PVT) compensation is proposed and verified in a 90-nm CMOS process. Consisting of the dynamic source bias and gate controlled technique, the proposed mixed-voltage I/O buffer realized by only $1 {rm xV}_{rm DD}$ devices can successfully transmit and receive $2times {rm V}_{rm DD}$ signal. Utilizing this technique with only $1 {rm xV}_{rm DD}$ devices, the digital logic gates are also modified to have $2 {rm xV}_{rm DD}$-tolerant capability. With $2 {rm xV}_{rm DD}$ -tolerant logic gates, the PVT variation detector has been implemented to detect PVT variations from $2times {rm V}_{rm DD}$ signal and provide compensation control to the $2times {rm V}_{rm DD}$-tolerant I/O buffer without suffering the gate-oxide overstress issue.
机译:一个新的 $ 2倍{rm V} _ {rm DD} $ 容忍的输入/输出(I / O)缓冲区,在90纳米CMOS工艺中提出并验证了工艺,电压和温度(PVT)补偿。由动态源极偏置和栅极控制技术组成,拟议的混合电压I / O缓冲器仅通过 $ 1 {rm xV} _ {rm DD} $ 设备可以成功发送和接收 $ 2倍{rm V} _ {rm DD} $ 信号。仅使用 $ 1 {rm xV} _ {rm DD} $ 设备使用此技术,数字逻辑门也被修改为具有 $ 2 {rm xV} _ {rm DD} $ 容错能力。使用 $ 2 {rm xV} _ {rm DD} $ 容错逻辑门,已实现了PVT变化检测器来检测来自 $ 2倍{rm V} _ {rm DD} $ 信号的PVT变化,并提供对 $ 2倍于{rm V} _ {rm DD} $ 的I / O缓冲区,而不会遇到栅极氧化物超负荷问题。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号