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首页> 外文期刊>IEEE Photonics Technology Letters >InP-Based 1.3-1.6-(mu)m VCSELs With Selectively Etched Tunnel-Junction Apertures on a Wavelength Flexible Platform
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InP-Based 1.3-1.6-(mu)m VCSELs With Selectively Etched Tunnel-Junction Apertures on a Wavelength Flexible Platform

机译:基于InP的1.3-1.6-μmVCSEL,在波长灵活平台上具有选择性刻蚀的隧道结孔

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摘要

In this letter, the authors demonstrate a wavelength flexible platform for the production of long-wavelength vertical-cavity surface-emitting lasers which provide full wavelength coverage from 1.3-1.6 (mu)m. All-epitaxial InP-based devices with AsSb-based distributed Bragg reflectors were achieved through a common design, process, and growth technology at both the important telecommunications wavelengths of 1.3 and 1.5 (mu)m. Thin selectively etched tunnel junctions were implemented as low-loss apertures and offer scalability to small device dimensions. Devices showed low threshold currents ( 20 dB) operation, and high differential efficiency (>40percent at 1.3 (mu)m and >25percent at 1.5 (mu)m).
机译:在这封信中,作者展示了一种波长柔性平台,用于生产长波长垂直腔面发射激光器,该激光器可提供1.3-1.6μm的全波长范围。通过共同的设计,工艺和生长技术,在1.3和1.5μm的重要电信波长上,都实现了具有基于AsSb的分布式布拉格反射器的基于InP的全外延器件。选择性蚀刻的薄隧道结实现为低损耗孔,可扩展至小尺寸器件。器件显示出低阈值电流(20 dB),高差分效率(1.3μm时> 40%,1.5μm时> 25%)。

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