首页> 外文期刊>IEEE Photonics Technology Letters >Impact-Ionization-Induced Bandwidth-Enhancement of a Si–SiGe-Based Avalanche Photodiode Operating at a Wavelength of 830 nm With a Gain-Bandwidth Product of 428 GHz
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Impact-Ionization-Induced Bandwidth-Enhancement of a Si–SiGe-Based Avalanche Photodiode Operating at a Wavelength of 830 nm With a Gain-Bandwidth Product of 428 GHz

机译:冲击电离引起的基于Si-SiGe的雪崩光电二极管的带宽增强,该二极管工作在830 nm的波长下,增益带宽积为428 GHz

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摘要

We demonstrate a high-performance Si–SiGe-based vertical-illuminated avalanche photodiode (APD) operating in the 830-nm wavelength regime. The trade-off between the gain and bandwidth performance of a traditional APD can be overcome due to the impact-ionization-induced resonant effect in the measured frequency responses with an internal radio-frequency gain. Furthermore, under avalanche operation, the low-frequency ( ${<}$100 MHz) roll-off caused by the slow diffusion current from the n $^{+}$ silicon substrate can also be minimized. A wide 3-dB bandwidth (15.3 GHz) and an extremely high gain-bandwidth (428 GHz), with 18% external efficiency, can be achieved simultaneously in our device, without using complex silicon-on-insulator or germanium-on-insulator substrates to block the slow photocurrent from the silicon substrate.
机译:我们演示了一种基于Si-SiGe的高性能垂直照明雪崩光电二极管(APD),其工作在830 nm波长范围内。传统的APD的增益和带宽性能之间的折衷可以被克服,这是因为在内部射频增益的测量频率响应中,碰撞电离引起的共振效应。此外,在雪崩操作下,由n $ ^ {+} $硅衬底的缓慢扩散电流引起的低频($ {<} $ 100 MHz)滚降也可以被最小化。在我们的设备中,无需使用复杂的绝缘体上硅或绝缘体上锗,就可以同时实现3dB的宽带宽(15.3 GHz)和极高的增益带宽(428 GHz),外部效率为18%衬底以阻挡来自硅衬底的缓慢的光电流。

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