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首页> 外文期刊>IEEE Photonics Technology Letters >High-Temperature Stability of 650-nm Resonant-Cavity Light-Emitting Diodes Fabricated Using Wafer-Bonding Technique on Silicon Substrates
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High-Temperature Stability of 650-nm Resonant-Cavity Light-Emitting Diodes Fabricated Using Wafer-Bonding Technique on Silicon Substrates

机译:利用硅片晶圆键合技术制造的650 nm谐振腔发光二极管的高温稳定性

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摘要

AlGaInP-based visible 650-nm GaInP– AlGaInP resonant-cavity light-emitting diodes (RCLEDs) with high- temperature stability were fabricated by wafer-bonding techniques on Si substrates. In this study, the metal-bonding RCLEDs (MBRCLEDs) devices were designed with 84-$mu$m apertures for light output. The MBRCLEDs with a maximum wall-plug efficiency of 13.7% were demonstrated at an injection current of 2.5 mA. In addition, the improved heat sinking of MBRCLEDs led to lower junction temperature, and resulted in a very low power decay of 0.31 dB from room temperature to 100 $^{circ}$C at an injection current of 20 mA.
机译:通过晶圆键合技术在硅衬底上制造了具有高温稳定性的基于AlGaInP的可见光650 nm GaInP–AlGaInP谐振腔发光二极管(RCLED)。在这项研究中,金属键合RCLED(MBRCLED)器件设计有84-μm的光圈,用于光输出。在2.5 mA的注入电流下,MBRCLED的最大壁塞效率为13.7%。另外,改进的MBRCLED的散热导致较低的结温,并且在20 mA的注入电流下,从室温到100 100C的功率衰减非常低,为0.31 dB。

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