Fabrication of High Precision Self-Aligned V-Grooves Integrated on Silica-on-Silicon Chips

摘要

In this letter, we propose a simple method to fabricate V-grooves integrated on silica-on-silicon chips. We have utilized the photolithographic self-alignment principle to form the etching mask for V-grooves during waveguide core etching. With such designed processes, the waveguides and V-grooves can be fabricated without any lateral displacement.