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首页> 外文期刊>IEEE journal of selected topics in quantum electronics >Novel laser structures based on MQW interdiffusion using rapid thermal annealing technique
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Novel laser structures based on MQW interdiffusion using rapid thermal annealing technique

机译:快速热退火技术基于MQW互扩散的新型激光结构

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摘要

In this paper, experimental results for GaAlAs-GaAs multiple-quantum-well (MQW) interdiffusion using rapid thermal annealing (RTA) technique under different processing conditions are presented and discussed. Two kinds of novel laser structures based on such technique are also proposed and fabricated. First, a laser diode with window region for high-power operation is designed and fabricated. The maximum output power of such a device shows an increase by 18% over laser diodes without interdiffused window region. Then a transverse mode controlled laser structure taking advantages of the refractive index change induced by MQW interdiffusion is realized using RTA technique. Single-mode operation up to four times the threshold current has been demonstrated for this RTA treated laser diode.
机译:本文介绍并讨论了在不同工艺条件下使用快速热退火(RTA)技术进行GaAlAs-GaAs多量子阱(MQW)互扩散的实验结果。还提出并制造了两种基于这种技术的新型激光结构。首先,设计并制造了具有窗口区域的大功率工作激光二极管。与没有相互扩散的窗口区域的激光二极管相比,这种设备的最大输出功率增加了18%。然后利用RTA技术实现了利用MQW互扩散引起的折射率变化的横向模式控制激光结构。对于这种经过RTA处理的激光二极管,已经证明其单模式操作的最高阈值电流是其四倍。

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