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首页> 外文期刊>IEEE journal of selected topics in quantum electronics >A quantitative study of radiative, Auger, and defect related recombination processes in 1.3-Μm GaInNAs-based quantum-well lasers
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A quantitative study of radiative, Auger, and defect related recombination processes in 1.3-Μm GaInNAs-based quantum-well lasers

机译:基于1.3微米GaInNAs的量子阱激光器中与辐射,俄歇和缺陷相关的重组过程的定量研究

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摘要

By measuring the spontaneous emission (SE) from normally operating ∼1.3-Μm GaInNAs-GaAs-based lasers we have quantitatively determined the variation of each of the current paths present in the devices as a function of temperature from 130 K to 370 K. From the SE measurements we determine how the current I close to threshold, varies as a function of carrier density n, which enables us to separate out the main current paths corresponding to monomolecular (defect-related), radiative or Auger recombination. We find that defect-related recombination forms ∼55% of the threshold current at room temperature (RT). At RT, radiative recombination accounts for ∼20% of Ith with the remaining ∼25% being due to nonradiative Auger recombination. Theoretical calculations of the threshold carrier, density as a function of temperature were also performed, using a ten-band k · p Hamiltonian. Together with the experimentally determined defect-related, radiative, and Auger currents we deduce the temperature variation of the respective recombination coefficients (A, B, and C). These are compared with theoretical calculations of the coefficients and good agreement is obtained. Our results suggest that by eliminating the dominant defect-related current path, the threshold current density of these GaInNAs-GaAs-based devices would be approximately halved at RT. Such devices could then have threshold current densities comparable with the best InGaAsP/InP-based lasers with the added advantages provided by the GaAs system that are important for vertical integration.
机译:通过测量正常工作的约1.3μmGaInNAs-GaAs基激光器的自发发射(SE),我们定量确定了设备中存在的每个电流路径随温度从130 K到370 K的变化。在SE测量中,我们确定电流I接近阈值如何随载流子密度n的变化而变化,这使我们能够分离出对应于单分子(与缺陷相关),辐射或俄歇复合的主要电流路径。我们发现,与缺陷相关的重组形成了室温(RT)时〜阈值电流的约55%。在室温下,辐射重组约占Ith的20%,其余约25%是由于非辐射俄歇重组引起的。还使用十波段k·p哈密顿量,对阈值载流子,密度与温度的关系进行了理论计算。连同实验确定的缺陷相关的,辐射的和俄歇电流,我们推断出各个复合系数(A,B和C)的温度变化。将这些与系数的理论计算进行比较,并获得了很好的一致性。我们的结果表明,通过消除与缺陷相关的主要电流路径,这些基于GaInNAs-GaAs的器件的阈值电流密度在RT时将大约减半。这样的设备可以具有可与最佳基于InGaAsP / InP的激光器相媲美的阈值电流密度,并具有GaAs系统提供的对于垂直集成非常重要的附加优势。

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