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Near Infrared InAs/GaAsSb Quantum Dot Light Emitting Diodes

机译:近红外InAs / GaAsSb量子点发光二极管

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A series of light-emitting diodes (LEDs) with active layers based on InAs quantum dots (QDs) covered by GaAsSb capping layers is presented. Varying the Sb content in the capping layer from ~2 to ~28%, room temperature electroluminescence (EL) from 1.15 to 1.5 μm is obtained. The external efficiency of the devices, next, increases as the Sb is increased up to ~15% and then decreases for higher Sb contents, consistently with the reported increase of QD height with the Sb content up to ~15% and the band alignment transition from type I to type II above ~15% Sb. An analysis of the EL and photocurrent spectra shows that the emission from type I LEDs originates from the recombination between electrons and holes confined in the QDs. On the other hand, the EL from the type II devices is the combination of two different processes. First, recombination between electrons confined in the QDs and holes at the capping layer. Second, a type I-like recombination of electrons from the QDs and holes residing in extended levels of the quantum well composed by the capping layer and the QDs. The mechanisms responsible for the thermal quenching of the EL are also studied. Escape of holes from the QD to the capping layer is identified as the dominant mechanism for the type I devices, whereas in type II structures it is the escape of electrons from QD excited levels to the barrier which dominates.
机译:提出了一系列具有有源层的发光二极管(LED),该有源层基于被GaAsSb覆盖层覆盖的InAs量子点(QD)。将覆盖层中的Sb含量从〜2更改为〜28%,可获得室温电致发光(EL)为1.15至1.5μm。接下来,器件的外部效率随着Sb升高至〜15%而增加,然后随着更高的Sb含量而降低,这与报告的QD高度随Sb含量高达〜15%的增加和能带取向跃迁一致从I型到II型〜15%Sb以上对EL和光电流光谱的分析表明,I型LED的发射源于电子与量子点中所约束的空穴之间的复合。另一方面,II型器件的EL是两种不同工艺的组合。首先,限制在量子点中的电子与覆盖层上的空穴之间的复合。其次,来自量子点和位于由覆盖层和量子点构成的量子阱的扩展能级中的空穴的电子的类I型复合。还研究了负责EL热淬火的机理。空穴从QD逃逸到覆盖层被认为是I型器件的主要机制,而在II型结构中,则是电子从QD激发能级逃逸到势垒。

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