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首页> 外文期刊>IEEE Journal of Quantum Electronics >Growth and fabrication of high-performance 980-nm strained InGaAs quantum-well lasers for erbium-doped fiber amplifiers
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Growth and fabrication of high-performance 980-nm strained InGaAs quantum-well lasers for erbium-doped fiber amplifiers

机译:用于掺fiber光纤放大器的高性能980 nm应变InGaAs量子阱激光器的生长和制造

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A 980-nm strained InGaAs quantum-well (QW) laser is the preferred pump source for an Er/sup 3+/-doped fiber amplifier for the next generation of lightwave communication systems because of lower noise, high power conversion efficiency, and low temperature sensitivity. Obtaining long lifetime, narrow far field, high power output in the fundamental transverse mode centered at 980/spl plusmn/5 nm, and planarity of the structure while maintaining low threshold current density (J/sub th/) and high differential quantum efficiency (/spl eta/) are the major challenges. Here, we report our work aimed at optimizing the design, growth, and fabrication of 980-nm lasers to address some of these issues. We demonstrate very low broad-area J/sub th/, of 47 A/spl middot/cm/sup -2/, operation up to 200/spl deg/C, and a very low linewidth enhancement factor of 0.54 of these lasers. We have also monolithically integrated 980-nm lasers with 850-nm GaAs QW lasers. To minimize coincorporation of nonradiative recombination impurities like oxygen and displacement of the p junction due to Be diffusion during MBE growth, we suggest that the Be doping should be dispensed with on the p-side of the GRIN region and the n-side GRIN region should be doped with Si. The optical properties of InGaAs QW's are insensitive to the type of the arsenic beam used, As/sub 2/ versus As/sub 4/. Although strained InGaAs QW lasers grown using As/sub 2/ at a constant substrate temperature as low as 570/spl deg/C have a lower J/sub th/, they also exhibit a 10-25% lower /spl eta/ as compared to the As/sub 4/. counterpart in which the AlGaAs cladding layers are grown at /spl sim/700/spl deg/C. To obtain a planar structure and to prevent the fabrication related defects, we have used a novel method in which the laser structure is first grown by MBE, and mesas are formed by in situ melt etching using SiO/sub 2/ stripes as a mask followed by regrowth of p/sup -/-p-n AlGaAs isolating layers by LPE. Compared to ridge waveguide (RWG) lasers, the buried heterostructure lasers so fabricated have significantly lower threshold current, higher power output; higher temperature operation, lower cavity losses, and kink-free light-current (L-I) characteristics, as expected. A CW power of 150 mW/facet at 986 nm was measured from a 400-/spl mu/m-long BH laser with 11-/spl mu/m active stripe width. A minimum threshold current of 2.5 mA was measured for lasers with 3.0-/spl mu/m active width and 300-400 /spl mu/m cavity length. The L-I characteristics of 500-, 800-, and 1300-/spl mu/m-long lasers with 3.0-/spl mu/m active width were linear up to the currents corresponding to a current density of 10 kA/spl middot/cm/sup -2/. At higher current densities, a sublinear increase of power with current was observed. Stable fundamental transverse mode operation was obtained up to 100-mW emitted power.
机译:980 nm应变InGaAs量子阱(QW)激光器是下一代光波通信系统中Er / sup 3 +/-掺杂光纤放大器的首选泵浦源,因为它具有较低的噪声,较高的功率转换效率和较低的噪声温度敏感性。获得长寿命,狭窄的远场,在基本横向模式下以980 / spl plusmn / 5 nm为中心的高功率输出以及结构的平面性,同时保持低阈值电流密度(J / sub th /)和高差分量子效率( / spl eta /)是主要挑战。在这里,我们报告了我们的工作,旨在优化980 nm激光器的设计,生长和制造,以解决其中的一些问题。我们展示了极低的广域J / sub th /,47 A / spl中点/ cm / sup -2 /,高达200 / spl deg / C的操作,以及这些激光器的0.54的极低线宽增强因子。我们还将980 nm激光器与850 nm GaAs QW激光器单片集成。为了最大程度地减少非辐射重组杂质的共价结合,例如氧和MBE生长过程中由于Be扩散而导致的p / n结位移,我们建议在GRIN区的p侧和n侧GRIN上应放弃Be掺杂区域应掺杂Si。 InGaAs QW的光学特性对所使用的砷束类型As / sub 2 /与As / sub 4 /不敏感。尽管使用As / sub 2 /在低至570 / spl deg / C的恒定衬底温度下生长的应变InGaAs QW激光器具有较低的J / sub th /,但与之相比,它们也表现出低10-25%的/ spl eta /到As / sub 4 /。在/ spl sim / 700 / spl deg / C下生长AlGaAs覆层的对应物。为了获得平面结构并防止与制造相关的缺陷,我们使用了一种新颖的方法,其中首先通过MBE生长激光结构,然后使用SiO / sub 2 /条带作为掩模,通过原位熔融蚀刻形成台面。通过LPE重新生长p / sup-/-pn AlGaAs隔离层。与脊形波导(RWG)激光器相比,如此制造的掩埋异质结构激光器具有更低的阈值电流和更高的功率输出;如预期的那样,在更高的温度下工作,更低的腔损耗和无扭结的光电流(L-I)特性。从400- / splμ/ m长的BH激光器以11- / splμ/ m的有源条纹宽度测量了在986 nm处150 mW /面的CW功率。对于有源宽度为3.0- / spl mu / m,腔长为300-400 / spl mu / m的激光器,测量的最小阈值电流为2.5 mA。 500、800和1300 / spl mu / m长的有源宽度为3.0- / spl mu / m的激光的LI特性呈线性直至电流对应于10kA / spl middot / cm的电流密度/ sup -2 /。在较高的电流密度下,观察到功率随电流呈亚线性增加。在高达100mW的发射功率下获得了稳定的基本横向模式工作。

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