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首页> 外文期刊>IEEE Journal of Quantum Electronics >Analysis of characteristic temperature for InGaAsP BH lasers with p-n-p-n blocking layers using two-dimensional device simulator
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Analysis of characteristic temperature for InGaAsP BH lasers with p-n-p-n blocking layers using two-dimensional device simulator

机译:使用二维设备模拟器分析具有p-n-p-n阻挡层的InGaAsP BH激光器的特征温度

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The threshold current and the characteristic temperature of 1.3-/spl mu/m InGaAsP-InP buried heterostructure (BH) lasers with the p-n-p-n blocking layers have been numerically analyzed using a two-dimensional (2-D) device simulator. The simulation model includes optical gain, intervalence absorption, radiative spontaneous-emission current. Auger recombination current, Shockley-Read-Hall recombination current, and heterobarrier leakage current. In addition to these components, the leakage current flowing through the p-n-p-n blocking layer which was ignored so far is also included. The analysis of the current components reveals that the increase in the threshold current with temperature is due to Auger recombination and the leakage current through the p-n-p-n blocking layer. The calculated T/sub 0/ value containing all the components is 54 K at room temperature and 29 K above 80/spl deg/C, which is consistent with observed T/sub 0/ values. When the leakage current through the p-n-p-n blocking layer is ignored in the calculation, the T/sub 0/ value is improved to 90 K and a decrease in the T/sub 0/ value is not observed. This result is consistent with conventional calculations. When Auger recombination is ignored. the T/sub 0/ value increases to 110 K at room temperature. However, the threshold current increases beyond the exponential relationship I/sub th/=I/sub 0/ exp(T/T/sub 0/) and the T/sub 0/ value decreases to 34 K at high temperature. This is due to a large increase rate of the leakage current through the p-n-p-n blocking layer. The reduction of Auger recombination is effective in decreasing the threshold current while the reduction of the leakage current through the p-n-p-n blocking layer is effective in improving T/sub 0/ values at high temperature, since T/sub 0/ values correspond to the increase rate of the threshold current.
机译:使用二维(2-D)器件模拟器对具有p-n-p-n阻挡层的1.3- / splμm/ m InGaAsP-InP埋入式异质结构(BH)激光器的阈值电流和特征温度进行了数值分析。仿真模型包括光学增益,间隔吸收,辐射自发发射电流。俄歇复合电流,肖克利阅读霍尔复合电流和异质栅泄漏电流。除这些成分外,还包括流经到目前为止被忽略的p-n-p-n阻挡层的泄漏电流。对电流分量的分析表明,阈值电流随温度的增加是由于俄歇复合和通过p-n-p-n阻挡层的泄漏电流引起的。计算出的包含所有成分的T / sub 0 /值在室温下为54 K,在80 / spl deg / C以上为29 K,这与观察到的T / sub 0 /值一致。当在计算中忽略通过p-n-p-n阻挡层的泄漏电流时,T / sub 0 /值提高到90 K,并且未观察到T / sub 0 /值降低。该结果与常规计算一致。当俄歇复合被忽略时。在室温下,T / sub 0 /值增加到110K。但是,阈值电流增加到超过指数关系I / sub th / = I / sub 0 / exp(T / T / sub 0 /),并且在高温下,T / sub 0 /值减小到34K。这是由于通过p-n-p-n阻挡层的泄漏电流的增加率很大。降低俄歇重组可有效降低阈值电流,而降低通过pnpn阻挡层的泄漏电流可有效提高高温下的T / sub 0 /值,因为T / sub 0 /值对应于增长率阈值电流的

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