Critical Dimension Measurement Scanning Electron Microscope for ULSI (S-8000 Series)

摘要

The semiconductor industry is moving from half-micron to quarter-micron design rules. To support this evolution, Hitachi has developed a new critical dimension measurement scanning electron microscope (CD-SEM), the model S-8000 series, for quality control of quarter-micron process lines. The new CD-SEM provides detailed examination of process conditions with 5-nm resolution and 5-nm repeatability (3σ) at 800V using secondary electron imaging. In addition, due to the development of a new load-lock system, it is capable of achieving a high sample throughput of 20 wafers/h (5 point measurements perwafer) under continuous operation. To support user friendliness, the system incorporates a graphical user interface (GUI), an automated pattern recognition system which helps locating measurement points, both manual and semi-automated operation, and user-programmable operating parameters.