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Studies of impurity deposition/implantation in JET divertor tiles using SIMS and ion beam techniques

机译:使用SIMS和离子束技术研究JET偏滤器瓦中的杂质沉积/注入

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At the end of C4 campaign at JET, a 1 % SiH_4/99% D_2 mixture and pure ~(13)CH_4 were injected into the torus from the outer divertor wall and from the top of the vessel, respectively, in order to study material transport and scrape-off layer (SOL) flows. A set of MkIIGB tiles was removed during the 2001 shutdown for surface analysis. The tiles were analysed with secondary ion mass spectrometry (SIMS) and time-of-flight elastic recoil detection analysis (TOF-ERDA). ~(13)C was detected in the inner divertor wall tiles implying material transport from the top of the vessel. Silicon was detected mainly at the outer divertor wall tiles and very small amounts were found in the inner divertor wall tiles. Si amounts in the inner divertor wall tiles were so low that rigorous conclusions about material transport from divertor outboard to inhoard cannot be made.
机译:在JET的C4战役结束时,分别从分散器外壁和容器顶部向圆环中注入1%SiH_4 / 99%D_2混合物和纯〜(13)CH_4,以便研究材料传输和刮除层(SOL)流。在2001年停工期间,移除了一组MkIIGB瓷砖进行表面分析。用二次离子质谱(SIMS)和飞行时间弹性反冲检测分析(TOF-ERDA)对瓷砖进行了分析。在内部偏滤器内墙砖中检测到〜(13)C,这意味着从容器顶部的物料运输。硅主要在外滤光器墙砖中检测到,而在内滤光器墙砖中发现的硅很少。内偏滤器内墙砖中的硅含量太低,以致于无法得出关于从偏滤器外侧到室内的材料运输的严格结论。

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