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Noise characteristics of lattice-matched InGaAs/InAlAs heterostructure p-i-n photodiodes

机译:晶格匹配的InGaAs / InAlAs异质结构p-i-n光电二极管的噪声特性

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Summary form only given. The authors report the experimental characterization of a set of three InGaAs/InAlAs heterostructure p-i-n photodiodes. Current-voltage, capacitance-voltage, S-parameter, and noise data were collected at room temperature over a wide range of bias current and voltage and a function of incident light intensity. The first device consisted of 360 alternating, undoped, lattice-matched In/sub 0.53/Ga/sub 0.47/As and In/sub 0.52/Al/sub 0.48/As layers 30 AA wide, sandwiched between an n/sup +/ and a p/sup +/ absorption layer of In/sub 0.53/Ga/sub 0.47/As. In the second and third device the number of layers and the layer width were respectively 200 and 90 AA and 50 and 500 AA. The capacitance-voltage data indicate that, in the dark, the heterostructure photodiodes are depleted gradually when the reverse bias is increased, i.e. one quantum well at a time. As a result, two high-field depleted regions at the contacts and a low-field undepleted region in the center are formed. Upon illumination by a light-emitting diode (1350 nm), the p-i-n photodiodes show large excess noise levels up to 500 MHz. Beyond this frequency the 30-AA devices show full short noise at field strengths E where impact ionization and Zener tunneling are absent, 0>E>220 kV/cm. The 90- and 500-AA devices, however, show distinctive subshot noise levels in the same field and frequency region. This difference in device operation can be understood in terms of the properties of the quantum-well structures located in the i-region of the device.
机译:仅提供摘要表格。作者报告了一组三个InGaAs / InAlAs异质结构p-i-n光电二极管的实验特性。在室温下,在宽范围的偏置电流和电压以及入射光强度的函数下收集电流-电压,电容-电压,S参数和噪声数据。第一个器件由360个交替的,未掺杂的,晶格匹配的In / sub 0.53 / Ga / sub 0.47 / As和In / sub 0.52 / Al / sub 0.48 / As宽30 AA的层组成,夹在n / sup +/-之间。 ap / sup + / In / sub 0.53 / Ga / sub 0.47 / As的吸收层。在第二和第三装置中,层数和层宽度分别为200和90AA,以及50和500AA。电容-电压数据表明,在黑暗中,当反向偏压增加时,即一次一个量子阱,异质结构光电二极管逐渐耗尽。结果,在触点处形成两个高电场耗尽区和在中心处的低电场未耗尽区。在被发光二极管(1350 nm)照射后,p-i-n光电二极管显示出高达500 MHz的较大的过大噪声电平。超过此频率,30-AA器件在场强E处表现出完全的短噪声,其中没有碰撞电离和齐纳隧穿,0> E> 220 kV / cm。但是,90和500-AA器件在相同的场和频率区域显示出不同的子弹噪声水平。可以根据位于器件的i区中的量子阱结构的性质来理解器件操作中的这种差异。

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