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Characteristics of p-i junction amorphous silicon stripe-type photodiode array and its application to contact image sensor

机译:p-i结非晶硅条型光电二极管阵列的特性及其在接触式图像传感器中的应用

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Various sandwich structures of photodiode arrays using hydrogenated amorphous silicon films fabricated under similar process conditions were compared. As a result of this comparison, the p-i junction amorphous silicon stripe-type photodiode array was studied. This photodiode array has the same excellent sensor performance characteristics for contact image sensors as the p-i-n junction type, and it has a similar process. A contact image sensor using this photodiode array with eight elements/mm resolution and A4 size is discussed. This compact, high performance sensors was applied to GIII facsimiles.
机译:比较了使用在类似工艺条件下制造的氢化非晶硅膜的光电二极管阵列的各种三明治结构。作为该比较的结果,研究了p-i结非晶硅条型光电二极管阵列。该光电二极管阵列具有与p-i-n结类型相同的,用于接触式图像传感器的出色传感器性能特性,并且具有相似的工艺。讨论了使用此光电二极管阵列的接触式图像传感器,其分辨率为8个元素/毫米,A4尺寸。这种紧凑的高性能传感器被应用于GIII传真机。

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