首页> 外文期刊>IEEE Transactions on Electron Devices >Improved drift in two-phase, long-channel, shallow buried-channel CCDs with longitudinally nonuniform storage-gate implants
【24h】

Improved drift in two-phase, long-channel, shallow buried-channel CCDs with longitudinally nonuniform storage-gate implants

机译:具有纵向非均匀存储栅注入的两相,长通道,浅埋通道CCD的漂移得到改善

获取原文
获取原文并翻译 | 示例

摘要

Two-phase buried-channel charge-coupled devices (CCDs) with a gradient in the storage wells, generated by a nonuniform channel doping parallel to the surface, were studied at room temperature and at 77 K. The built-in drift fields improve the charge transfer efficiency by more than an order of magnitude, consistently with two-dimensional simulations.
机译:在室温和77 K下研究了由平行于表面的非均匀沟道掺杂产生的在存储井中具有梯度的两相掩埋沟道电荷耦合器件(CCD)。内置漂移场改善了与二维模拟一致,电荷转移效率提高了一个数量级以上。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号