首页> 外文期刊>IEEE Transactions on Electron Devices >Base transit time in abrupt GaN/InGaN/GaN HBT's
【24h】

Base transit time in abrupt GaN/InGaN/GaN HBT's

机译:突然的GaN / InGaN / GaN HBT中的基本渡越时间

获取原文
获取原文并翻译 | 示例
       

摘要

Base transit time in an abrupt GaN/InGaN/GaN HBT is reported. Temperature and doping concentration dependence of low field mobility is obtained from an ensemble Monte Carlo simulation. Base transit time, /spl tau//sub b/, decreases with increasing temperature. The low temperature /spl tau//sub b/ is dominated by the diffusion constant or, in other words, transport within the neutral base region. However, at elevated temperatures base transit time is dependent more upon the base-collector junction velocity or, in other words, by the transport across the heterointerface. /spl tau//sub b/ increases with In-mole fraction showing a stronger dependence at lower temperatures. Unity gain current cut-off frequency, f/sub T/, is a strong function of temperature and base doping concentration. An f/sub T/ of 20 GHz is obtained for a 0.05 /spl mu/m HBT.
机译:报告了突然的GaN / InGaN / GaN HBT中的基极渡越时间。低温度迁移率的温度和掺杂浓度依赖性是从整体蒙特卡洛模拟中获得的。随着温度的升高,基本渡越时间/ spl tau // sub b /减少。低温以扩散常数或换句话说在中性基极区域内的传输为主导。然而,在升高的温度下,碱的迁移时间更多地取决于基极-集电极的结速度,或者换句话说,取决于跨异质界面的传输。 / spl tau // sub b /随着摩尔内分数的增加而增加,在较低温度下显示出较强的依赖性。单位增益电流截止频率f / sub T /是温度和基极掺杂浓度的强大函数。对于0.05 / spl mu / m的HBT,可获得20 GHz的f / sub T /。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号